Modern photolithography machines must deliver extraordinary precision on a repeatable basis, and in high volume production. In response to demands for increased throughput in the semiconductor ...
silicon wafer (pre-treated) into the device. 3: The device uses a combination of extreme ultraviolet (EUV) light and mirrors to transfer the design on a photomask onto a wafer. 4: The same pattern is ...
Modern semiconductor fabrication involves aligning silicon wafers and photolithography masks to nanometre precision. As the industry shifts from using 200 mm diameter wafers to 300 mm wafers, ...
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