The research team proposed a method called aberration-converged annular lithography (ACAL) system, as schematic diagram shown in Figure 1. The Gaussian beam is converted into a collimated annular beam ...
High-performance nanophotonic devices require extreme depth-to-diameter ratios, which are notoriously difficult to fabricate.
Researchers developed wet-etching-assisted single-pulse nanolithography to fabricate nanoholes in sapphire with ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results